Browsing by Author "Socha, R."
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Publication CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques
Proceedings paper1999, Optical Microlithography XII, 14/03/1999, p.228-238Publication Implementation of pattern-specific illumination pupil optimization on Step & Scan systems
Proceedings paper2004, Optical Microlithography XVII, 22/02/2004, p.1323-1333Publication Mask topography effect in chromeless phase lithography
Proceedings paper2004, 24th Annual BACUS Symposium on Photomask Technology, 13/09/2004, p.669-679Publication Optical solutions for contact hole lithography at the 90nm node and beyond
Proceedings paper2002, Semicon Japan: SEMI Technology Symposium, 4/12/2002