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Browsing by Author "Soussou, Assawer"

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    Evaluation of the impact of source/drain epi implementation on logic performance using combined process and circuit simulation

    Soussou, Assawer  
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    Schram, Tom  
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    Miyaguchi, Kenichi  
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    Chakarov, Ivan
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    Parvais, Bertrand  
    Proceedings paper
    2020, International Conference on Solid State Devices and Materials - SSDM 2020, 27/09/2020, p.A-5-03
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    Introducing 2D-FETs in Device Scaling Roadmap using DTCO

    Ahmed, Zubair  
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    Afzalian, Aryan  
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    Schram, Tom  
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    Jang, Doyoung  
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    Verreck, Devin  
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    Smets, Quentin  
    Proceedings paper
    2020, IEEE International Electron Devices Meeting (IEDM), DEC 12-18, 2020
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    Process sensitivity analysis for EPE optimization of MP18 SALELE BEOL patterning

    Soussou, Assawer
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    Kljucar, Luka  
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    Dusa, Mircea  
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    Mountsier, Tom
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    Jurczak, Gosia
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    Lowe, Brett
    Proceedings paper
    2025, 2025 Conference on Metrology Inspection and Process Control-Annual, FEB 24-28, 2025, p.1
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    Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond

    Baudot, Sylvain  
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    Soussou, Assawer  
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    Milenin, Alexey  
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    Ervin, Joe
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    Demuynck, Steven  
    Oral presentation
    2018, SPIE Advanced Lithography
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    Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond

    Baudot, Sylvain  
    ;
    Soussou, Assawer  
    ;
    Milenin, Alexey  
    ;
    Hopf, Toby  
    ;
    Wang, Shouhua  
    ;
    Weckx, Pieter  
    Proceedings paper
    2019, Advances in Patterning Materials and Processes XXXVI, 24/02/2019, p.109600N

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