Browsing by Author "Spence, Chris"
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Publication 28nm-pitch Ru interconnects patterned with 0.33NA-EUV single exposure
Proceedings paper2021, International Conference on Extreme Ultraviolet Lithography, SEP 27-OCT 01, 2021, p.32-41Publication A new paradigm for in-line detection and control of patterning defects
Proceedings paper2015, Metrology, Inspection, and Process Control for Microlithography XXIX, 22/02/2015Publication Mask Contribution to OPC Model Accuracy
Proceedings paper2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020, p.115171D