Repository logo Institutional repository
  • Communities & Collections
  • Scientific publicationsOpen knowledge
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Timmermans, Frank"

Filter results by typing the first few letters
Now showing 1 - 3 of 3
  • Results per page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Perspectives and tradeoffs of absorber materials for high NA EUV lithography

    Erdmann, Andreas
    ;
    Mesilhy, Hazem
    ;
    Evanschitzky, Peter
    ;
    Philipsen, Vicky  
    ;
    Timmermans, Frank
    Journal article
    2020, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, (19) 4
  • Loading...
    Thumbnail Image
    Publication

    Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography

    Erdmann, Andreas
    ;
    Mesilhy, Hazem
    ;
    Evanschitsky, Peter
    ;
    Philipsen, Vicky  
    ;
    Timmermans, Frank
    Proceedings paper
    2020, Extreme Ultraviolet (EUV) Lithography XI, 23/02/2020, p.1132309
  • Loading...
    Thumbnail Image
    Publication

    Stitching for High NA: zooming in on CDU budget

    Davydova, Natalia
    ;
    van Look, Lieve
    ;
    Weldeslassie, Ataklti  
    ;
    Wiaux, Vincent  
    ;
    Huddleston, Laura
    Proceedings paper
    2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275002

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings