Browsing by Author "Tomizuka, Shosuke"
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Publication Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33
Proceedings paper2025, Photomask Technology, 2025-09-22, p.1368711Publication Bright-field EUV mask patterning for extending scaling roadmap
Proceedings paper2025, Photomask Technology, 2025-09-22, p.136870RPublication High-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer Print
Proceedings paper2025, Photomask Technology, 2025-09-22, p.1368713