imec Institutional Repository Browsing {{ collection }} by Author "Tsai, W."

Publication

Approaching Fermi level unpinning in oxide-In0.2Ga0.8As

Chiang, T.H.

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Lee, W.C.

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Lin, T.D.

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Lin, Dennis

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Shiu, K.H.

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Kwo, J.

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Wang, W.E.

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Tsai, W.

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Hong, M.

Proceedings paper

2008, IEEE International Electron Devices Meeting - IEDM, 15/12/2008, p.375-378

Publication

Challenges in integration of metal gate high-k dielectrics gate stacks

Tsai, W.

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Proceedings paper

2004, Advanced Short-Time Thermal Processing for Si-Based CMOS Devices II, 9/05/2004, p.321-327

Publication

High-k materials for advanced gate stack dielectrics: a comparison of ALCVD and MOCVD as deposition technologies

Caymax, Matty

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Bender, Hugo

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Brijs, Bert

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Conard, Thierry

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De Gendt, Stefan

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Delabie, Annelies

Proceedings paper

2003, CMOS Front-End Materials and Process Technology, 21/04/2003, p.47-58

Publication

Plasma modification of Hf based high-k dielectrics: effect of nitridation and silicon nitride deposition

Tsai, W.

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Maes, J.W.

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De Witte, Hilde

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Chen, J.

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Delabie, Annelies

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Carter, Richard

Proceedings paper

2004, Physics and Technology of High-k Gate Dielectrics II, 12/10/2003, p.37-46

Browsing by Author "Tsai, W."