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Browsing by Author "Van Hemmen, J.L."

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    Physical characterization of ALD Al2O3 films deposited on GaAs substrates

    Franquet, Alexis  
    ;
    Conard, Thierry  
    ;
    Vandervorst, Wilfried  
    ;
    Sioncke, Sonja
    ;
    Caymax, Matty  
    Meeting abstract
    2008, 14th International Conference on Thin Films - ICTF 14, 17/11/2008, p.46
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    Thermal and plasma enhanced atomic layer deposition of Al2O3 on GaAs substrates

    Sioncke, Sonja
    ;
    Delabie, Annelies  
    ;
    Brammertz, Guy  
    ;
    Conard, Thierry  
    ;
    Franquet, Alexis  
    Journal article
    2009, Journal of the Electrochemical Society, (156) 4, p.H255-H262
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    Thermal and plasma enhanced atomic layer deposition of Al2O3 on GaAs substrates

    Sioncke, Sonja
    ;
    Caymax, Matty  
    ;
    Conard, Thierry  
    ;
    Delabie, Annelies  
    ;
    Franquet, Alexis  
    ;
    Heyns, Marc  
    Meeting abstract
    2008, 8th International Conference on Atomic Layer Deposition - ALD, 30/06/2008

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