Browsing by Author "Vankerckhoven, Hans"
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Publication Can we increase the efficiency of organic contamination removal by ozone/di-water processes by using additives
Oral presentation2002, UCPSS - Ultra Clean Processing Technology SymposiumPublication Determination of degradation products in O3/DI processes
Oral presentation2001, 15th World Congress of the International Ozone Association; 10-15 September 2001; London, UK.Publication Determination of photoresist degradation products in O3/DI water processing
; ; Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.207-210Publication Photoresist stripping by Ozone/water processes: effect of additives
Proceedings paper2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.309-313Publication Removal of photoresist by O3DI water processes: determination of degradation products
Meeting abstract2001, 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac, 2/09/2001Publication Removal of photoresist by O3DI water processes: determination of degradation products
Proceedings paper2002, Cleaning Technology in Semiconductor Device Manufacturing VII, 4/09/2001, p.77-84Publication The increasing importance of the use of ozone in micro-electronics industry
Oral presentation2001, 15th World Congress of the International Ozone Association; 10-15 September 2001; London, UK.Publication The removal of organic contamination by O3/DI water processes: a theoretical study
Proceedings paper2002, Cleaning Technology in Semiconductor Device Manufacturing VII, 4/09/2001, p.54-60Publication The removal of organic contamination by O3/DI water processes: a theoretical study
Meeting abstract2001, 200th Meeting of the Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device Manufac, 2/09/2001