Browsing by Author "Voloshin, D.G."

Now showing 1 - 3 of 3

Low-k films modification under EUV and VUV radiation

Rakhimova, T.
;
Rakhimov, A.
;
Mankelevich, Y.A.
;
Lopaev, D.V.
;
Kovalev, A.S.
;
Vasil'eva, A.N.
Journal article
2014, Journal of Physics D: Applied Physics, (47) 2, p.25102
Recombination of O and H atoms with low-k SiOCH films pretreated in He plasma

Baklanov, Mikhaïl
;
Braginsky, O.V.
;
Kovalev, A.S.
;
Lopaev, D.V.
;
Mankelevich, Y.A.
Proceedings paper
2009, Materials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics, 14/04/2009, p.1156-D01-06
The effect of He plasma treatment on properties of organosilicate glass low-k films

Braginsky, O.V.
;
Kovalev, A.S.
;
Lopaev, D.V.
;
Malykhin, E.M.
;
Mankelevich, Y.A.
;
Proshina, O.V.
Journal article
2011, Journal of Applied Physics, (109) 4, p.43303