Browsing by Author "Waldhoer, D."
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Publication Atomic Hydrogen Exposure to Enable High-Quality Low-Temperature SiO2 with Excellent pMOS NBTI Reliability Compatible with 3D Sequential Tier Stacking
Proceedings paper2020, IEEE International Electron Devices Meeting (IEDM), DEC 12-18, 2020Publication Evidence of Tunneling Driven Random Telegraph Noise in Cryo-CMOS
Proceedings paper2021, IEEE International Electron Devices Meeting (IEDM), DEC 11-16, 2021Publication Gate oxide reliability: upcoming trends, challenges, and opportunities
Proceedings paper2024, IEEE Silicon Nanoelectronics Workshop (SNW) / Symposium on VLSI Technology and Circuits, 2024-06-15, p.3-4Publication The Effect of Resonant Tunneling on Random Telegraph Noise in the Cryogenic Regime
Proceedings paper2024, 2024 International Integrated Reliability Workshop-IIRW-Annual, 2024-10-06