Publication:
Atomic Hydrogen Exposure to Enable High-Quality Low-Temperature SiO2 with Excellent pMOS NBTI Reliability Compatible with 3D Sequential Tier Stacking
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764 since deposited on 2021-12-06
101last month
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Acq. date: 2026-08-20
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2102 since deposited on 2021-12-06
3last month
Acq. date: 2026-08-20
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