Publication:
Atomic Hydrogen Exposure to Enable High-Quality Low-Temperature SiO2 with Excellent pMOS NBTI Reliability Compatible with 3D Sequential Tier Stacking
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Acq. date: 2026-09-14
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816 since deposited on 2021-12-06
75last month
13last week
Acq. date: 2026-09-14
Views
2102 since deposited on 2021-12-06
Acq. date: 2026-09-14
Citations