Publication:
Atomic Hydrogen Exposure to Enable High-Quality Low-Temperature SiO2 with Excellent pMOS NBTI Reliability Compatible with 3D Sequential Tier Stacking
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516 since deposited on 2021-12-06
71last month
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Acq. date: 2026-04-07
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2095 since deposited on 2021-12-06
2last month
1last week
Acq. date: 2026-04-07
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