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Atomic Hydrogen Exposure to Enable High-Quality Low-Temperature SiO2 with Excellent pMOS NBTI Reliability Compatible with 3D Sequential Tier Stacking

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336 since deposited on 2021-12-06
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Acq. date: 2026-01-09

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2090 since deposited on 2021-12-06
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Acq. date: 2026-01-09

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Downloads

336 since deposited on 2021-12-06
57last month
9last week
Acq. date: 2026-01-09

Views

2090 since deposited on 2021-12-06
2last month
1last week
Acq. date: 2026-01-09

Citations