Repository logo Institutional repository
  • Communities & Collections
  • Browse
  • Site
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Werkhoven, Chris"

Filter results by typing the first few letters
Now showing 1 - 5 of 5
  • Results Per Page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Electrical properties and reliability of ultrathin remote plasma enhanced CVD Si3N4 layers

    Houssa, Michel  
    ;
    Degraeve, Robin  
    ;
    Pomarede, C.
    ;
    van Dijk, Kitty
    ;
    Werkhoven, Chris
    ;
    Mertens, Paul  
    Oral presentation
    1999, 30th IEEE Semiconductor Interface Specialists Conference
  • Loading...
    Thumbnail Image
    Publication

    Ge deep sub-micron HiK/MG pFET with superior drive compared to Si HiK/MG state-of-the-art reference

    De Jaeger, Brice  
    ;
    Kaczer, Ben  
    ;
    Zimmerman, Paul
    ;
    Opsomer, Karl  
    ;
    Winderickx, Gillis  
    Journal article
    2007-01, Semiconductor Science and Technology, (22) 1, p.S221-S226
  • Loading...
    Thumbnail Image
    Publication

    Influence of pre and post process conditions on the composition of thin Si3N4 thin films (3nm) studied by XPS and TOFSIMS

    Conard, Thierry  
    ;
    De Witte, Hilde
    ;
    Vandervorst, Wilfried  
    ;
    Houssa, Michel  
    ;
    Heyns, Marc  
    Proceedings paper
    2000, Structure and Electronic Properties of Ultrathin Dielectrics on Silicon and Related Structures; November 1999; Boston, MA, USA., p.69-74
  • Loading...
    Thumbnail Image
    Publication

    Influence of pre and post process conditions on the composition of thin Si3Ni4 thin films (3nm) studied by XPS and TOFSIMS

    Conard, Thierry  
    ;
    De Witte, Hilde
    ;
    Vandervorst, Wilfried  
    ;
    Houssa, Michel  
    ;
    Heyns, Marc  
    Oral presentation
    1999, Materials Research Society Fall Meeting; October 1999; Boston, MA, USA.
  • Loading...
    Thumbnail Image
    Publication

    Single wafer CVD of silicon nitride for CMOS gate applications

    Pomarede, C.
    ;
    Werkhoven, Chris
    ;
    Weidmann, J.
    ;
    Bergman, T.
    ;
    Gschwandtner, A.
    ;
    Houssa, Michel  
    Proceedings paper
    1999, Ultrathin SiO2 High-K Materials for ULSI Gate Dielectrics, 5/04/1999, p.147-154

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings