Browsing by Author "Willson, C. Grant"
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Publication A progress report on DSA of high-chi silicon containing block co-polymers
Publication Defect mitigation in sub-20 nm patterning with high-chi, silicon containing block copolymers
Proceedings paper2018, 4th International Symposium on DSA, 11/11/2018Publication EUV resist requirements: absorbance and acid yield
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727332Publication Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 4, p.43011Publication Strategies for increasing the rate of defect annihilation in the directed self-assembly of high- $v block copolymers
Journal article2019, ACS Applied Materials & Interfaces, (11) 51, p.48419-48427