Browsing by Author "Wolfling, Shay"
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Publication Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 21/02/2016, p.977807Publication Scatterometry and X-ray metrology for in-line control of spin-transfer torque magnetic random access memory (STT-MRAM) devices
Oral presentation2018, SPIE Advanced Lithography ConferencePublication Selectivity process control using in-line XPS for self-assembly monolayer-based selective deposition process
Oral presentation2018, SPIE Aadvanced Litography