Browsing by Author "Younkin, Todd R."
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Publication Critical material properties for pattern collapse mitigation
Journal article2012, Journal of Micro/Nanolithography MEMS and MOEMS, (11) 3, p.33004Publication Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication Poly(olefin sulfone)s as non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Oral presentation2009, 11th Pacific Polymer Conference - PPC11