Browsing by Author "Zimmermann, Joerg"

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Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells

Bekaert, Joost
;
Laenens, Bart
;
Verhaegen, Staf
;
Van Look, Lieve
;
Trivkovic, Darko
Journal article
2011-03, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13008
Performance of FlexRay, a fully programmable illumination system for generation of freeform sources on high NA immersion systems

Mulder, Melchior
;
Engelen, Andre
;
Noordman, Oscar
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Streutker, Gert
;
van Drieenhuizen, Bert
Proceedings paper
2010, Optical Microlithography XXIII, 21/02/2010, p.76401P
Simulation of polychromatic effects in high NA EUV lithography

Erdmann, Andreas
;
Mesilhy, Hazem
;
Evanschitzky, Peter
;
Saadeh, Qais
;
Soltwisch, Victor
Proceedings paper
2021, International Conference on Extreme Ultraviolet Lithography, SEP 27-OCT 01, 2021