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Browsing by Author "Zotovich, Alexey"

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    Advanced etching for nanodevices and 2D materials

    de Marneffe, Jean-Francois  
    ;
    Cooke, Mike
    ;
    Goodyear, Andy
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    Braithwaite, Nicolas
    ;
    Sutton, Yvonne
    Meeting abstract
    2016, SNM special session at MNE Conference, 19/09/2016
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    Comparative analysis of the factors leading to low-k degradation during the integration process

    Zotovich, Alexey
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    Krishtab, Mikhail  
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    Lazzarino, Frederic  
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    Baklanov, Mikhaïl
    Meeting abstract
    2014, International Conference in Micro- and Nanoelectronics, 6/10/2014
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    Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching

    Zotovich, Alexey
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    El Otell, Ziad  
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    de Marneffe, Jean-Francois  
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    Proshina, Olga
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    Lopaev, Dimitri
    Journal article
    2016, Plasma Sources Science and Technology, (25) 5, p.55001
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    Improved plasma resistance for porous low-k dielectrics by pore stuffing approach

    Zhang, Liping  
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    de Marneffe, Jean-Francois  
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    Heyne, Markus
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    Naumov, Sergej
    ;
    Sun, Yiting  
    Journal article
    2015, ECS Journal of Solid State Science and Technology, (4) 1, p.N3098-N3107
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    Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach

    Zotovich, Alexey
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    Rezvanov, Askar
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    Chanson, Romain
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    Zhang, L.
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    Hacker, N.
    ;
    Kurchikov, K.
    Journal article
    2018, Journal of Physics D: Applied Physics, (51) 32, p.325202
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    Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas

    Zotovich, Alexey
    ;
    El Otell, Ziad  
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    Sutton, Yvonne
    ;
    Braithwaite, N. St. J.
    Meeting abstract
    2016, Plasma Etch and Strip in Microtechnology - PESM, 9/05/2016
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    Vacuum ultra-violet emission of CF4 & CF3I containing plasmas and their effect on low-k materials

    El Otell, Ziad  
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    Samara, Vladimir
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    Zotovich, Alexey
    ;
    Hansen, Terje
    ;
    de Marneffe, Jean-Francois  
    Journal article
    2015, Journal of Physics D: Applied Physics, (48) 39, p.395202

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