Browsing by author "Jakschik, Stefan"
Now showing items 1-4 of 4
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Improved thermal stability of Ni-silicides on Si:C epitaxial layers
Machkaoutsan, Vladimir; Mertens, Sofie; Bauer, R.; Lauwers, Anne; Verheyden, Kurt; Vanormelingen, Koen; Verheyen, Peter; Loo, Roger; Caymax, Matty; Jakschik, Stefan; Theodore, D.; Absil, Philippe; Thomas, S.; Granneman, E.H.A. (2007) -
Ni(Pt)Si thermal stability improvement by carbon implantation
Mertens, Sofie; Hoffmann, Thomas Y.; Vrancken, Christa; Jakschik, Stefan; Richard, Olivier; Verleysen, Eveline; Bender, Hugo; Zhao, Chao; Vandervorst, Wilfried; Absil, Philippe; Lauwers, Anne (2008) -
Selective epitaxial Si/SiGe growth for VT shift adjustment in high k pMOS devices
Loo, Roger; Sorada, Haruyuki; Inoue, Akira; Lee, B.C; Hyun, Sangjin; Jakschik, Stefan; Lujan, Guilherme; Hoffmann, Thomas Y.; Caymax, Matty (2007) -
The impact of stacked cap layers on effective work function with HfSiON and SiON gate dielectrics
Cho, Hag-Ju; Yu, Hong Yu; Chang, Vincent S.; Akheyar, Amal; Jakschik, Stefan; Conard, Thierry; Hantschel, Thomas; Delabie, Annelies; Adelmann, Christoph; Van Elshocht, Sven; Ragnarsson, Lars-Ake; Schram, Tom; Absil, Philippe; Biesemans, Serge (2008-07)