Browsing by author "Word, James"
Now showing items 1-7 of 7
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3D Mask modeling for EUV lithography
Mailfert, Julien; Zuniga, Christian; Philipsen, Vicky; Adam, Konstantinos; Lam, Michael; Word, James; Hendrickx, Eric; Vandenberghe, Geert; Smith, Bruce (2012) -
Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Torres, J. Andres; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vandenberghe, Geert (2015) -
Directed self-assembly graphoepitaxy template generation with immersion lithography
Ma, Yuansheng; Lei, Junjiang; Torres, J. Andres; Hong, Le; Word, James; Fenger, Germain; Tritchkov, Alexander; Lippincott, George; Gupta, Rachit; Lafferty, Neal; He, Yuan; Bekaert, Joost; Vandenberghe, Geert (2015) -
Experimental determination and accurate modeling of the EUV ADT flare
Hendrickx, Eric; Lorusso, Gian; Fenger, Germain; Lam, Michael; Word, James (2009) -
Feasibility of compensating for EUV field edge effects through OPC
Maloney, Chris; Word, James; Fenger, Germain; Niroomand, Ardavan; Lorusso, Gian; Jonckheere, Rik; Hendrickx, Eric; Smith, Bruce (2014) -
Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration
Lorusso, Gian; Van Roey, Frieda; Hendrickx, Eric; Fenger, Germain; Lam, Michael; Christian, Zuniga; Habib, Mohamed; Diab, Hesham; Word, James (2009) -
Model based OPC for 1st generation 193-nm lithography
Lucas, Kevin; Word, James; Vandenberghe, Geert; Verhaegen, Staf; Jonckheere, Rik (2001)