Browsing by author "Nouri, F."
Now showing items 1-6 of 6
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Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS
Kraus, P.A.; Chua, T.C.; Ahmed, K.Z.; Campbell, J.; Nouri, F.; Cruise, J.; Rothschild, Aude; Veloso, Anabela; Mertens, Sofie; Schaekers, Marc; Cubaynes, F.N.; Date, Lucien; Schreutelkamp, Rob; Bauer, T.M. (2004) -
High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric
Wang, X.P.; Li, M.F.; Yu, HongYu; Yang, J.J.; Loh, W.Y.; Zhu, C.X.; Du, A.Y.; Trigg, A.D.; Zhang, G.; Sik, H.W.; Ren, C.; Lim, Andy; Lee, Rinus; Yu, X.F.; Chen, J.D.; Chin, Albert; Yeo, Y.C.; Biesemans, Serge; Chua, T.C.; Nouri, F.; Lo, Patrick; Kwong, D.L. (2007) -
Leakage current control in recessed SiGe source/drain junctions
Claeys, Cor; Bargallo Gonzalez, Mireia; Eneman, Geert; Verheyen, Peter; Bender, Hugo; Schreutelkamp, Rob; Washington, L.; Nouri, F.; Simoen, Eddy (2007) -
Study of dopant diffusion and defect evolution for advanced ultra shallow junctions based on atomistic kinetic monte carlo approach
Noda, T.; Vandervorst, Wilfried; Felch, S.; Parihar, V.; Vrancken, Christa; Severi, Simone; Hoffmann, Thomas Y.; Falepin, A.; Janssens, Tom; Bender, Hugo; Van Daele, B.; Eyben, Pierre; Niwa, M.; Schreutelkamp, R.; Nouri, F.; Absil, Philippe; Jurczak, Gosia; De Meyer, Kristin; Biesemans, Serge (2007) -
Study of Ni-Silicide contacts to Si:C source/drain
Cho, Moon Ju; Nouri, F.; Schreutelkamp, Rob; Kim, Y.; Mertens, Sofie; Verheyen, Peter; Steenbergen, Johnny; Vrancken, Christa; Richard, Olivier; Tokei, Zsolt; Lauwers, Anne; Bender, Hugo; Van Daele, Benny; Vandervorst, Wilfried; Geenen, Luc; Absil, Philippe; Kubicek, Stefan; Demeurisse, Caroline (2007) -
Study of pulsed RF DPN process parameters for 65 nm node MOSFET gate dielectrics
Rothschild, Aude; Kraus, P.A.; Chua, T.C.; Nouri, F.; Cubaynes, Florence; Veloso, Anabela; Mertens, Sofie; Date, Lucien; Schreutelkamp, Rob; Schaekers, Marc (2004)