Browsing by author "Iwamoto, Fumio"
Now showing items 1-13 of 13
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A methodology for double patterning compliant split and design
Wiaux, Vincent; Verhaegen, Staf; Iwamoto, Fumio; Maenhoudt, Mireille; Matsuda, Takashi; Postnikov, Sergey; Vandenberghe, Geert (2008) -
Dependence of EUV mask printing performance on blank architecture
Jonckheere, Rik; Hyun, Yoonsuk; Iwamoto, Fumio; Baudemprez, Bart; Hermans, Jan; Lorusso, Gian; Pollentier, Ivan; Goethals, Mieke; Ronse, Kurt (2008-03) -
EUV lithography program at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Chandhok, Manish; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Gronheid, Roel; Baudemprez, Bart; Ronse, Kurt (2007) -
EUVL at IMEC: shadowing compensation and Flare mitigation
Lorusso, Gian; Goethals, Mieke; Jonckheere, Rik; Hermans, Jan; Ronse, Kurt; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Ritter, D. (2007-11) -
Full field EUV lithography turning into reality at IMEC
Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Hermans, Jan; Baudemprez, Bart; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Ronse, Kurt (2007) -
Implementing full field EUV lithography using the ADT
Goethals, Mieke; Hendrickx, Eric; Jonckheere, Rik; Lorusso, Gian; Baudemprez, Bart; Hermans, Jan; Laidler, David; Niroomand, Ardavan; Van Roey, Frieda; van Dijk, Andre; Romijn, Leon; Stepanenko, Nickolay; Timoshkov, Vadim; Iwamoto, Fumio; Myers, Alan; Hyun, Yoonsuk; Lim, Changmoon; Pollentier, Ivan; Leeson, Michael; de Marneffe, Jean-Francois; Demuynck, Steven; Ronse, Kurt (2008) -
Innovative metrology for wafer edge defectivity in immersion lithography
Pollentier, Ivan; Iwamoto, Fumio; Kocsis, Michael; Somanchi, Anoop; Burkeen, Frank; Vedula, Srinivas (2007) -
Investigation of EUV mask defectivity via full-field printing and inspection on wafer
Jonckheere, Rik; Van Den Heuvel, Dieter; Iwamoto, Fumio; Stepanenko, Nickolay; Myers, Alan; Lamantia, Matthew; Goethals, Mieke; Hendrickx, Eric; Ronse, Kurt (2009) -
Investigation of mask defectivity in full field EUV lithography
Jonckheere, Rik; Iwamoto, Fumio; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt; Koop, H.; Schmoeller, T. (2007) -
Mask defect printability in full field EUV lithography
Jonckheere, Rik; Iwamoto, Fumio; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt (2007) -
Progress in full field EUV lithography program at IMEC
Goethals, Mieke; Lorusso, Gian; Jonckheere, Rik; Baudemprez, Bart; Hermans, Jan; Iwamoto, Fumio; Kim, Byeong Soo; Kim, In Sung; Myers, Alan; Niroomand, Ardavan; Stepanenko, Nickolay; Van Roey, Frieda; Pollentier, Ivan; Ronse, Kurt (2007) -
Split and design guidelines for double patterning
Wiaux, Vincent; Verhaegen, Staf; Cheng, Shaunee; Iwamoto, Fumio; Jaenen, Patrick; Maenhoudt, Mireille; Matsuda, Takashi; Postnikov, Sergey; Vandenberghe, Geert (2008) -
Status of EUV lithography at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Ronse, Kurt (2007)