Browsing by author "Jiang, Jing"
Now showing items 1-7 of 7
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Difference in EUV photoresist design towards reduction of LWR and LCDU
Jiang, Jing; De Simone, Danilo; Vandenberghe, Geert (2017) -
Impact of acid statistics on EUV local critical dimension uniformity
Jiang, Jing; De Simone, Danilo; Yildirim, Oktay; Meeuwissen, Marieke; Hoefnagels, Rik; Rispens, Gijs; Derks, Paul; Custers, Rolf (2017) -
Metal sensitizer in chemically amplified EUV resist: a study of sensitivity enhancement and dissolution
Jiang, Jing; De Simone, Danilo; Vandenberghe, Geert (2017) -
Role of metal sensitizers for sensitivity improvement in EUV chemically amplified resist
Yamamoto, Hiroki; Vesters, Yannick; Jiang, Jing; De Simone, Danilo; Vandenberghe, Geert; Kozawa, Takahiro (2019-01) -
Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement
Vesters, Yannick; Jiang, Jing; Yamamoto, Hiroki; De Simone, Danilo; Kozawa, Takahiro; De Gendt, Stefan; Vandenberghe, Geert (2018) -
Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
Vesters, Yannick; Jiang, Jing; Yamamoto, Hiroki; De Simone, Danilo; Kozawa, Takahiro; De Gendt, Stefan; Vandenberghe, Geert (2019-12) -
Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure
Pollentier, Ivan; Vesters, Yannick; Jiang, Jing; Vanelderen, Pieter; De Simone, Danilo (2017)