Browsing by author "Wilhelm, Rudi"
Now showing items 1-7 of 7
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Alternative gate insulator materials for future generation MOSFETs
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Jos; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, R.; Wilhelm, Rudi; Young, Edward; Zhao, Chao (2001) -
Critical processes for ultra-thin gate oxide integrity
Depas, Michel; Heyns, Marc; Nigam, Tanya; Kenis, Karine; Sprey, Hessel; Wilhelm, H.; Wilhelm, Rudi; Crossley, A.; Sofield, C. J.; Gräf, D. (1996) -
Engineering of the polysilicon emitter interfacial layer using low temperature thermal re-oxidation in an LPCVD cluster tool
Decoutere, Stefaan; Cuthbertson, Alan; Wilhelm, Rudi; Vandervorst, Wilfried; Deferm, Ludo (1995) -
High k dielectric materials prepared by atomic layer CVD
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Guido; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, Wilfried; Wilhelm, Rudi; Yang, E.; Zhao, Chao (2001) -
Sub 3 nm gate oxide growth and reliability
Depas, Michel; Heyns, Marc; Sprey, Hessel; Wilhelm, Rudi (1997) -
Ultra thin gate oxide technology and reliability
Heyns, Marc; Depas, Michel; Teerlinck, Ivo; Meuris, Marc; Mertens, Paul; Vanhellemont, Jan; Mouche, Laurent; Nigam, Tanya; Wilhelm, Rudi; Knotter, Martin; Wolke, K.; Crossley, A.; Sofield, C. J.; Gräf, D. (1996) -
Ultra-thin gate oxides below 3 nm grown in a cluster tool
Depas, Michel; Nigam, Tanya; Kenis, Karine; Heyns, Marc; Sprey, Hessel; Wilhelm, Rudi (1996)