Browsing by author "Han, Jeong Hwan"
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Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O3: growth behaviour and film characteristics
Han, Jeong Hwan; Ungur, Elisaveta; Franquet, Alexis; Opsomer, Karl; Conard, Thierry; Moussa, Alain; De Gendt, Stefan; Van Elshocht, Sven; Adelmann, Christoph (2013-07) -
Front end of the line process
Han, Jeong Hwan; Cho, Moon Ju; Delabie, Annelies; Park, Tae Joo; Hwang, cheol seong (2014) -
Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes
Han, Jeong Hwan; Lee, Sang Woon; Choi, Byung Joon; Eom, Taeyong; Kim, Seong Keun; Song, Seul Ji; Lee, Woongkyu; Hwang, cheol seong (2013) -
Ozone-based atomic layer deposition of Gd2O3 from tris(isopropyl-cyclopentadienyl) gadolinium: growth characteristics and surface chemistry
Han, Jeong Hwan; Delabie, Annelies; Franquet, Alexis; Conard, Thierry; Van Elshocht, Sven; Adelmann, Christoph (2015-12) -
Reaction Chemistry during the Atomic Layer Deposition of Sc2O3 and Gd2O3 from Sc(MeCp)3, Gd(iPrCp)3, and H2O
Han, Jeong Hwan; Nyns, Laura; Delabie, Annelies; Franquet, Alexis; Van Elshocht, Sven; Adelmann, Christoph (2014)