Browsing by author "Maslow, Mark"
Now showing items 1-8 of 8
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Co-optimization of lithographic and patterning processes for improved EPE performance
Maslow, Mark; Timoshkov, Vadim; Kiers, Ton; Jee, Tae Kwon; de Loijer, Peter; Morikita, Shinya; Demand, Mark; Metz, Andrew W; Okada, Soichiro; Kumar, Kaushik A.; Biesemans, Serge; Yaegashi, Hidetami; Di Lorenzo, Paolo; Bekaert, Joost; Mao, Ming; Beral, Christophe; Lariviere, Stephane (2017) -
Elucidating the role of imaging metrics for variability and after etch defectivity
Franke, Joern-Holger; Frommhold, Andreas; Dauendorffer, Arnaud; Nafus, Kathleen; Rispens, Gijsbert; Maslow, Mark (2022) -
Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
Franke, Joern-Holger; Frommhold, Andreas; Davydova, Natalia; Aubert, Remko; Nair, Vineet Vijayakrishnan; Kovalevich, Tatiana; Rio, David; Bekaert, Joost; Wang, Erik; Rispens, Gijsbert; Maslow, Mark; Hendrickx, Eric (2021) -
SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform
Bekaert, Joost; Di Lorenzo, Paolo; Mao, Ming; Decoster, Stefan; Lariviere, Stephane; Franke, Joern-Holger; Blanco, Victor; Kutrzeba Kotowska, Bogumila; Lazzarino, Frederic; Gallagher, Emily; Hendrickx, Eric; Leray, Philippe; Kim, Ryan Ryoung han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Maslow, Mark; Timoshkov, Vadim; Kiers, Ton (2017) -
Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications
Wiaux, Vincent; Bekaert, Joost; Kovalevich, Tatiana; Ryckaert, Julien; Hendrickx, Eric; Davydova, Natalia; Woltgens, Pieter; de Winter, Laurens; Maslow, Mark; Troost, Kars; Tien, Ming-Chun (2020) -
The imec iN7 EUV platform: M2-Block and Via patterning developments
Bekaert, Joost; Franke, Joern-Holger; Mao, Ming; Lariviere, Stephane; Decoster, Stefan; Di Lorenzo, Paolo; Kutrzeba Kotowska, Bogumila; Blanco, Victor; Hendrickx, Eric; Gallagher, Emily; Leray, Philippe; Kim, Ryan Ryoung han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Timoshkov, Vadim; Kiers, Ton; Maslow, Mark (2016) -
Today's scorecard for tomorrow's photoresist: progress and outlook towards High-NA EUV lithography
Santaclara, Jara G; Rispens, Gijsbert; Bekaert, Joost; Thiam, Arame; Maslow, Mark; Hoefnagels, Rik; Zuurbier, Nadia; van Lent, Lidia; Fong Choi, Yin (2021) -
Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes
Franke, Joern-Holger; Bekaert, Joost; Wiaux, Vincent; Nair, Vineet Vijayakrishnan; Hendrickx, Eric; Davydova, Natalia; van Dijk, Andre; Wang, Erik; Maslow, Mark (2020)