Browsing by author "Smith, Bruce"

3D Mask modeling for EUV lithography

Mailfert, Julien; Zuniga, Christian; Philipsen, Vicky; Adam, Konstantinos; Lam, Michael; Word, James; Hendrickx, Eric; Vandenberghe, Geert; Smith, Bruce (2012)

A method of image-based aberration metrology for EUVL tools

Levinson, Zac; Raghunathan, Sudhar; Verduijn, Erik; Wood, Obert; Mangat, Pawitter; Goldberg, Kenneth; Benk, Markus; Wojdyla, Antoine; Philipsen, Vicky; Hendrickx, Eric; Smith, Bruce (2015)

Characterization of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

Raghunathan, Sudhar; Wood, Obert; Mangat, Pawitter; Verduijn, Erik; Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Goldberg, Ken; Benk, Marcus; Kearney, Pat; Levinson, Zachary; Smith, Bruce (2014)

Feasibility of compensating for EUV field edge effects through OPC

Maloney, Chris; Word, James; Fenger, Germain; Niroomand, Ardavan; Lorusso, Gian; Jonckheere, Rik; Hendrickx, Eric; Smith, Bruce (2014)

Gray bar masking: fabrication and imaging for 193 nm

Smith, Bruce; Vandenberghe, Geert; Martin, P. W.; Rack, P.; Hsu, S.; Chen, F. (2001)

Mask-induced polarization effects at high NA

Estroff, Andrew; Fan, Yongfa; Bourov, Anatoly; Smith, Bruce; Foubert, Philippe; Leunissen, Peter; Philipsen, Vicky; Aksenov, Yuri (2005-03)

Mitigating mask roughness via pupil filtering

Baylav, Burak; Maloney, Chris; Levinson, Zac; Bekaert, Joost; Vaglio Pret, Alessandro; Smith, Bruce (2014)