Browsing by author "Wolstenholme, J."

Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition

Houssiau, L.; Vitchev, R.G.; Pireaux, J.J.; Conard, Thierry; Bender, Hugo; Richard, Olivier; Mack, P.; Wolstenholme, J.; Defranoux, C. (2003)

Physical characterization of mixed HfAlOx layers by complementary analysis techniques

Bender, Hugo; Conard, Thierry; Richard, Olivier; Brijs, Bert; Petry, Jasmine; Vandervorst, Wilfried; Defranoux, C.; Boher, P.; Rochat, N.; Wyon, C.; Mack, P.; Wolstenholme, J.; Vitchev, E.; Houssiau, L.; Pireaux, J-J.; Bergmaier, A.; Dollinger, G. (2004)

Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques

Bender, Hugo; Conard, Thierry; Richard, Olivier; Brijs, Bert; Petry, Jasmine; Vandervorst, Wilfried; Defranoux, C.; Boher, P.; Rochat, N.; Wyon, C.; Mack, P.; Wolstenholme, J.; Vitchev, R.; Houssiau, L.; Pireaux, J.J.; Bergmaier, A.; Dollinger, G. (2003)

Vacuum UV spectroscopic ellipsometry applied to the characterization of high-k dielectrics

Boher, P.; Defranoux, C.; Heinrich, P.; Wolstenholme, J.; Bender, Hugo (2003)

VUV spectroscopic ellipsometry applied to the characterization of high-k dielectrics

Boher, P.; Defranoux, C.; Heinrich, P.; Wolstenholme, J.; Bender, Hugo (2004)

X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface

Vitchev, R.G.; Pireaux, J.J.; Conard, Thierry; Bender, Hugo; Wolstenholme, J.; Defranoux, C. (2004)