Browsing by author "Kilpela, Olli"
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Characterization of TiN films deposited by atomic layer deposition
Besling, W.F.A.; Satta, Alessandra; Schuhmacher, Jörg; Beyer, Gerald; Maex, Karen; Kilpela, Olli; Sprey, Hessel (2002) -
Development of sub-10-nm atomic layer deposition barriers for Cu/low-k interconnects
Beyer, Gerald; Satta, Alessandra; Schuhmacher, Jörg; Maex, Karen; Besling, Wim; Kilpela, Olli; Sprey, Hessel; Tempel, Georg (2002) -
Impact of ALCVD and PVD titanium nitride deposition on metal gate capacitors
Lujan, Guilherme; Schram, Tom; Pantisano, Luigi; Hooker, Jacob; Kubicek, Stefan; Röhr, Erika; Schuhmacher, Jörg; Kilpela, Olli; Sprey, Hessel; De Gendt, Stefan; De Meyer, Kristin (2002) -
Nucleation and growth of TiN films deposited by atomic layer deposition
Satta, Alessandra; Brongersma, Sywert; Schuhmacher, Jörg; Conard, Thierry; Beyer, Gerald; Maex, Karen; Viitanen, M.M.; Brongersma, H.H.; Besling, W.; Kilpela, Olli; Sprey, Hessel; Vantomme, Andre (2002)