Browsing by author "Schmoeller, Thomas"
Now showing items 1-8 of 8
-
Application of an inverse Mack model for negative tone development simulation
Gao, Weimin; Klostermann, Ulrich; Mülders, Thomas; Schmoeller, Thomas; Demmerle, Wolfgang; De Bisschop, Peter; Bekaert, Joost (2011) -
Calibration of physical resist models for simulation of extreme ultraviolet lithography
Klostermann, Ulrich K.; Muelders, Thomas; Schmoeller, Thomas; Lorusso, Gian; Hendrickx, Eric (2011) -
Calibration of physical resist models: methods, usability, and predictive power
Klostermann, Ulrich; Mülders, Thomas; Ponomarenco, Denis; Schmoeller, Thomas; Van de Kerkhove, Jeroen; De Bisschop, Peter (2009) -
EUV pattern shift compensation strategies
Schmoeller, Thomas; Klimpel, Thomas; Kim, In Sung; Lorusso, Gian; Myers, Alan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2008) -
Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Gao, Weimin; Klostermann, Ulrich; Kamohara, Itaru; Schmoeller, Thomas; Lucas, Kevin; Demmerle, Wolfgang; De Bisschop, Peter; Mailfert, Julien (2014) -
Fullfield 27nm CD control and modeling
Hendrickx, Eric; Philipsen, Vicky; Hermans, Jan; Lorusso, Gian; Vandenberghe, Geert; Ronse, Kurt; Klosterman, Ulrich; Gao, Weimin; Schmoeller, Thomas (2010) -
Impact of mask three dimensional effects on resist-model calibration
De Bisschop, Peter; Muelders, Thomas; Klostermann, Ulrich; Schmoeller, Thomas; Biafore, John; Robertson, Stewart A.; Smith, Mark (2009) -
Patterning process exploration of metal 1 layer in 7nm node with 3D pattering flow simulations
Gao, Weimin; Ciofi, Ivan; Saad, Yves; Matagne, Philippe; Bachman, Michael; Oulmane, Mohamed; Gillijns, Werner; Lucas, Kevin; Demmerle, Wolfgang; Schmoeller, Thomas (2015)