Browsing by author "Viitanen, M.M."
Now showing items 1-4 of 4
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A study of growth mechanism of TiN and WCN barrier films deposited by atomic layer deposition on different substrates
Satta, Alessandra; Schuhmacher, Jörg; Whelan, Caroline; Vandervorst, Wilfried; Brongersma, Sywert; Beyer, Gerald; Brijs, Bert; Conard, Thierry; Maex, Karen; Vantomme, Andre; Viitanen, M.M.; Brongersma, H.H. (2002) -
Growth mechanism and continuity of atomic layer deposited TiN films on thermal SiO2
Satta, Alessandra; Schuhmacher, Jörg; Whelan, Caroline; Vandervorst, Wilfried; Brongersma, Sywert; Beyer, Gerald; Maex, Karen; Vantomme, Andre; Viitanen, M.M.; Brongersma, H.H.; Besling, Wim (2002) -
Island growth in the atomic layer deposition of zirconium oxide and aluminium oxide on hydrogen-terminated silicon: growth mode modelling and transmission electron microscopy
Puurunen, Riikka; Vandervorst, Wilfried; Besling, Wim F. A.; Richard, Olivier; Bender, Hugo; Conard, Thierry; Zhao, Chao; Delabie, Annelies; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Viitanen, M.M.; De Ridder, M.; Brongersma, Hidde; Tamminga, Y.; Dao, T.; de Win, T.; Verheijen, M.; Kaiser, M.; Tuominen, M. (2004) -
Nucleation and growth of TiN films deposited by atomic layer deposition
Satta, Alessandra; Brongersma, Sywert; Schuhmacher, Jörg; Conard, Thierry; Beyer, Gerald; Maex, Karen; Viitanen, M.M.; Brongersma, H.H.; Besling, W.; Kilpela, Olli; Sprey, Hessel; Vantomme, Andre (2002)