Browsing by author "Knoll, Armin"
Now showing items 1-6 of 6
-
Advanced etching for nanodevices and 2D materials
de Marneffe, Jean-Francois; Cooke, Mike; Goodyear, Andy; Braithwaite, Nicolas; Sutton, Yvonne; Bowden, Mark; Altamirano Sanchez, Efrain; Zotovich, Alexey; El Otell, Ziad; Chan, BT; Knoll, Armin; Rawlings, Colin; Duerig, Urs; Spiesser, Martin; Kaestner, Marcus; Neuber, Christian; Rangelow, Ivo (2016) -
Conversion of a patterned organic resist into a high performance inoriganic hard mask for high resolution pattern transfer
de Marneffe, Jean-Francois; Chan, BT; Spieser, Martin; Vereecke, Guy; Naumov, Sergej; Vanhaeren, Danielle; Knoll, Armin; Wolf, Heiko (2018) -
Integration of the Sequential Infiltration Synthesis (SIS) on Polyphtaladehyde (PPA) resist for thermal Scanning Probe Lithography (t-SPL) patterning
Chan, BT; de Marneffe, Jean-Francois; Spieser, Martin; Knoll, Armin; Knaepen, Werner (2017) -
Molecular glass resists for all-dry high-resolution scanning probe lithography
Neuber, Christian; Cooke, Mike; Despont, Michel; Durig, Urs; Kastner, Markus; Knoll, Armin; de Marneffe, Jean-Francois; Rangelow, Ivo; Rawlings, Colin; De Schepper, Peter; Schmidt, Hans-Werner; Strohriegl, Peter (2013) -
Molecular glass resists for scanning probe lithography
Neuber, Christian; Ringk, Andreas; Kolb, Tristan; Wieberger, Floryan; Strohriegl, Peter; Schimdt, Hans-Werner; Fokkema, Vincent; Cooke, Mike; Rawlings, Colin; Durig, Urs; Knoll, Armin; de Marneffe, Jean-Francois; De Schepper, Peter; Kaestner, Marcus; Krivoshapkina, Yana; Budden, Matthias; Rangelow, Ivo (2014) -
Sequential infiltration synthesis for pattern transfer of sub 20 nm thermal scanning probe lithography patterns
Spiesser, Martin; Kulmala, Tero; Chan, BT; de Marneffe, Jean-Francois; Knoll, Armin (2018)