Browsing by author "Forester, Lynn"

Characterization and process integration of a low-k spin-on dielectric

Ballantyne, Catherine; Forester, Lynn; Waeterloos, Joost (1996)

Development of a global planarization process without CMP

Forester, Lynn; Coenegrachts, Bart; Stone, M.; Meynen, Herman; Grillaert, Joost; Van den hove, Luc (1994)

Development of a non-destructive thin film porosimetry: pore size distribution and pore volume of porous silica

Baklanov, Mikhaïl; Dultsev, F. N.; Kondoh, Eiichi; Mogilnikov, K. P.; Maex, Karen; Wang, Sharon; Forester, Lynn (1999)

Etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasma

Thompson, Heike; Vanhaelemeersch, Serge; Maex, Karen; Van Ammel, Annemie; Beyer, Gerald; Coenegrachts, Bart; Vervoort, Iwan; Waeterloos, Joost; Struyf, Herbert; Palmans, Roger; Forester, Lynn (1999)

Improved hot-carrier reliability in a 0.5-µm TLM CMOS process by back-end process optimization

Van den Bosch, Geert; Deferm, Ludo; Forester, Lynn; Collins, Tom (1994)

Integration of non-etchback low-k methy silsequioxane polymer using electron beam cure

Gao, Teng; Coenegrachts, Bart; Waeterloos, Joost; Van Hove, Marleen; Maex, Karen; Yang, Jiping; Wang, Sharon; Forester, Lynn (1999)

Interlevel dielectric engineering for improved device performance in half-micron CMOS

Forester, Lynn; Collins, Tom; Van den Bosch, Geert; Meynen, Herman; Coenegrachts, Bart; Van den hove, Luc (1994)