Browsing by author "Kim, Young-Chang"
Now showing items 1-20 of 21
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A methodology for the characterization of topography induced immersion bubble defects
Kocsis, Michael; De Bisschop, Peter; Maenhoudt, Mireille; Kim, Young-Chang; Wells, Greg; List, Scott; DiBiase, Tony (2005) -
Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning
Kim, Young-Chang; Beckx, Stephan; Vanhaelemeersch, Serge; Vandervorst, Wilfried (1998) -
Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning
Kim, Young-Chang; Beckx, Stephan; Vanhaelemeersch, Serge; Vandervorst, Wilfried (1999) -
ArF lithography options for 100-nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
ArF lithography options for 100nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
ArF lithography with combination of moderate OAI and attenuated PSM
Kim, Young-Chang; Vandenberghe, Geert; Verhaegen, Staf; Ronse, Kurt (2001) -
AttPSM CD control: mask bias and flare effects
Kim, Young-Chang; Vandenberghe, Geert; Ronse, Kurt (2002) -
Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM
Kim, Young-Chang; Vandenberghe, Geert; Verhaegen, Staf; Ronse, Kurt (2002) -
Characterization of Plasma-Etch-Cleaning
Kim, Young-Chang (1999-05) -
Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth
Kim, Young-Chang; Caymax, Matty; Bender, Hugo; Vanhaelemeersch, Serge (1998) -
Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth
Kim, Young-Chang; Caymax, Matty; Bender, Hugo; Vanhaelemeersch, Serge (1999) -
Characterization of the post dry-etch cleaning of silicon for Ti-self-aligned silicide technology
Kim, Young-Chang; Baklanov, Mikhaïl; Conard, Thierry; de Potter de ten Broeck, Muriel; Vanhaelemeersch, Serge (1999) -
Direct measurement of the inversion charge in MOSFETs: application to mobility extraction in alternative gate dielectrics
Kerber, Andreas; Cartier, Eduard; Ragnarsson, Lars-Ake; Rosmeulen, Maarten; Pantisano, Luigi; Degraeve, Robin; Kim, Young-Chang; Groeseneken, Guido (2003) -
Evaluation of stray light and quantitative analysis of its impact on lithography
Kim, Young-Chang; De Bisschop, Peter; Vandenberghe, Geert (2005) -
Origin of the threshold voltage instability in SiO2/HfO2 dual layer gate dielectrics
Kerber, Andreas; Cartier, Eduard; Pantisano, Luigi; Degraeve, Robin; Kauerauf, Thomas; Kim, Young-Chang; Hou, A.; Groeseneken, Guido; Maes, Herman; Schwalke, U. (2003) -
Protective films formed by RIE of Co and Ti silicides and ways of their removal
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Kim, Young-Chang; Storm, Wolfgang; Vandervorst, Wilfried; Maex, Karen (1996) -
Removal of Si-O, Si-C and Si-F by hydrogen bake after reactive ion etching on the silicon surface
Kim, Young-Chang; Caymax, Matty; Bender, Hugo; Vanhaelemeersch, Serge (1998) -
Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas. Reactive ion etching in CF4/CHF3 plasmas
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Storm, Wolfgang; Kim, Young-Chang; Vandervorst, Wilfried; Maex, Karen (1997) -
The formation and removal of residue formed during TiN fluorocarbon plasma etching
Kim, Young-Chang; Conard, Thierry; Vanhaeren, Danielle; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Vandervorst, Wilfried; Maex, Karen (1998) -
The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface
Kim, Young-Chang; Baklanov, Mikhaïl; Conard, Thierry; Vanhaelemeersch, Serge; Vandervorst, Wilfried (1998)