Browsing by author "Laidler, David"
Now showing items 41-46 of 46
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Thinking outside the box for improved overlay metrology
Pollentier, Ivan; Leray, Philippe; Laidler, David; Adel, M.; Ghinovker, M.; Poplawski, J.; Kassel, E.; Izikson, P. (2003) -
Toward sub-20nm pitch Fin patterning and integration with DSA
Sayan, Safak; Marzook, Taisir; Chan, BT; Vandenbroeck, Nadia; Singh, Arjun; Laidler, David; Altamirano Sanchez, Efrain; Leray, Philippe; Rincon Delgadillo, Paulina; Gronheid, Roel; Vandenberghe, Geert; Clark, William; Juncker, Aurelie (2016) -
Towards manufacturing a 10nm node device with complementary EUV lithography
Hermans, Jan; Dai, Huixiong; Niroomand, Ardavan; Laidler, David; Mao, Ming; Chen, Yongmei; Leray, Philippe; Ngai, Chris; Cheng, Shaunee (2013) -
Track optimization and control for 32nm node double patterning and beyond
Laidler, David; Rosslee, Craig; D'have, Koen; Leray, Philippe; Tedeschi, Len (2009) -
Verification and extension of the MBL technique for photoresist pattern shape measurement
Isawa, Miki; Tanaka, Maki; Kazumi, Hideyuki; Shishido, Chie; Hamamatsu, Akira; Hasegawa, Norio; De Bisschop, Peter; Laidler, David; Leray, Philippe; Cheng, Shaunee (2011) -
Wafer shape based in-plane distortion predictions using superfast 4G metrology
Van Dijk, Leon; Mileham, Jeffrey; Malakhovsky, Ilja; Laidler, David; Dekkers, Harold; Van Elshocht, Sven; Anberg, Doug; Owen, David M.; van Haren, Richard (2017)