Browsing by author "Hooge, Joshua"
Now showing items 1-8 of 8
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A CDU comparison of double-patterning process options using Monte Carlo simulation
Hooge, Joshua; Hatakeyama, Shinichi; Nafus, Kathleen; Scheer, Steven; Foubert, Philippe; Cheng, Shaunee; Leray, Philippe (2009) -
Comparison of directed self-assembly integrations
Somervell, Mark; Gronheid, Roel; Hooge, Joshua; Nafus, Kathleen; Rincon Delgadillo, Paulina; Thode, Chris; Younkin, Todd; Matsunaga, Koichi; Rathsack, Ben; Scheer, Steven; Nealy, Paul (2012) -
EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
EUV RLS performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
EUV secondary electron blur at the 22nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael; Fonseca, Carlos; Hooge, Joshua; Nafus, Kathleen; Biafore, John; Smith, Mark D. (2011) -
Image contrast contributions to immersion lithography defect formation and process yield
Rathsack, Ben; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Hatakeyama, Shinichi; Kouichi, Hontake; Kitano, Junichi; Van Den Heuvel, Dieter; Leray, Philippe; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel (2008) -
Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2011) -
Understanding and improving double patterning CDU through Monte Carlo simulation
Hooge, Joshua; Hatakeyama, Shinichi; Kubo, Akihiro; Kondo, Yoshihiro; Nafus, Kathleen; Scheer, Steven; Foubert, Philippe; Leray, Philippe; Cheng, Shaunee (2008)