Browsing by author "Driessen, Frank"
Now showing items 1-7 of 7
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A 65-nm node SRAM solution using alt-PSM with ArF lithography
Driessen, Frank; Zawadzki, Mary T.; Krishnan, Prakash R.; Balasinski, Artur; Vandenberghe, Geert (2004-05) -
Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node
Driessen, Frank; Philipsen, Vicky; Jonckheere, Rik; Liu, Hua-Yu; Karklin, Linard (2002) -
Complementary phase-shift mask towards 70-nm technology node
Driessen, Frank; Vandenberghe, Geert; Ercken, Monique; Montgomery, Patrick; Ronse, Kurt; Van Adrichem, Paul; Li, J.; Liu, H.Y.; Karklin, L. (2002) -
Extending ArF to the 65-nm node with full-phase lithography
Driessen, Frank; Pierrat, C.; Vandenberghe, Geert; Ronse, Kurt; Van Adrichem, Paul; Liu, H.Y. (2003) -
Full phase-shifting methodology for 65-nm node lithography
Pierrat, C.; Driessen, Frank; Vandenberghe, Geert (2003) -
Performance optimisation of the double exposure alternatin PSM for sub-100 nm ICs
Vandenberghe, Geert; Driessen, Frank; Van Adrichem, Paul; Ronse, Kurt (2001) -
Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs
Vandenberghe, Geert; Driessen, Frank; Van Adrichem, Paul; Ronse, Kurt; Li, Jason; Karklin, Linard (2002)