Browsing by author "Blakey, Idriss"
Now showing items 1-5 of 5
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Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
Lawrie, Kirsten J.; Blakey, Idriss; Blinco, James P.; Cheng, Han Hao; Gronheid, Roel; Jack, Kevin S.; Pollentier, Ivan; Leeson, Michael J.; Younkin, Todd; Whittaker, Andrew K. (2011) -
Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael; Younkin, Todd R.; Whittaker, Andrew K. (2009) -
Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: towards applications as EUV photoresists
Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael; Younkin, Todd; Whittaker, Andrew K. (2011) -
Poly(olefin sulfone)s - A materials platform for studying resist derived contamination
Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael; Younkin, Todd; Whittaker, Andrew (2010) -
Poly(olefin sulfone)s as non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael; Younkin, Todd R.; Whittaker, Andrew K. (2009)