Browsing by author "Smith, Mark D."
Now showing items 1-6 of 6
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EUV secondary electron blur at the 22nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael; Fonseca, Carlos; Hooge, Joshua; Nafus, Kathleen; Biafore, John; Smith, Mark D. (2011) -
Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael J.; Fonseca, Carlos; Hooge, Joshua S.; Nafus, Kathleen; Biafore, John J.; Smith, Mark D. (2011) -
Impact of mask line roughness in EUV lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Graves, Trey; Smith, Mark D.; Biafore, John (2011) -
Investigation of interactions between metrology and lithography with a CD SEM simulator
Smith, Mark D.; Fang, Chao; Biafore, John J.; Vaglio Pret, Alessandro; Robinson, Stewart A. (2014) -
Mask absorber roughness impact in extreme ultraviolet lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Graves, Trey; Smith, Mark D.; Biafore, John (2011) -
Understanding the impact of CD-SEM artifacts on metrology via experiments and simulations
Fang, Chao; Vaglio Pret, Alessandro; Smith, Mark D.; Biafore, John J.; Robertson, Steward; Bekaert, Joost (2015)