Browsing by author "Rathsack, Benjamin"
Now showing items 1-5 of 5
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Effect of PAG distribution on ArF and EUV resist performance
Gronheid, Roel; Rathsack, Benjamin; Bernard, Sophie; Vaglio Pret, Alessandro; Nafus, Kathleen; Hatakeyama, Shinichi (2009) -
EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
EUV RLS performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects
Rathsack, Benjamin; Nafus, Kathleen; Hatakeyama, Shinichi; Kuwahara, Yuhei; Kitano, Junichi; Gronheid, Roel; Vaglio Pret, Alessandro (2009) -
Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2011)