Browsing by author "Kondoh, Eiichi"
Now showing items 1-20 of 28
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A chemical role of refractory metal caps in Co silicidation: Evidence of SiO2 reduction by Ti cap
Kondoh, Eiichi; Conard, Thierry; Brijs, Bert; Jin, S.; Bender, Hugo; de Potter de ten Broeck, Muriel; Maex, Karen (1999) -
Applicability of HF solutions for contact hole cleaning on top of TiSi2
Baklanov, Mikhaïl; Kondoh, Eiichi; Vanhaelemeersch, Serge; Maex, Karen (1998) -
Applications of in-line oxygen monitoring to a rapid thermal processing tool: diagnosing gas flow dynamics and silicidation processes
Kondoh, Eiichi; Baklanov, Mikhaïl; Maex, Karen (2000) -
Characterisation of HF-last cleaning of ion-implanted Si surfaces
Kondoh, Eiichi; Baklanov, Mikhaïl; Jonckx, Franky; Maex, Karen (1998) -
Characterization of HF-last cleaning of ion-implanted Si surfaces
Kondoh, Eiichi; Baklanov, Mikhaïl; Maex, Karen (1998) -
Characterization of HF-last cleaning of ion-implanted Si surfaces
Kondoh, Eiichi; Baklanov, Mikhaïl; Maex, Karen (1999) -
Comparative study of pore size of low-dielectric-constant porous spin-on-glass films using different methods of nondestructive instrumentation
Kondoh, Eiichi; Baklanov, Mikhaïl; Lin, E.; Gidley, D.; Nakashima, A. (2001) -
Comparative study of porous SOG films with different non-destructive instrumentation
Baklanov, Mikhaïl; Kondoh, Eiichi; Linskens, Frank; Gidley, D. W.; Lee, Hean-Cheal; Mogilnikov, K. P.; Sune, Jorge (2001) -
Control and impact of processing ambient during rapid thermal silicidation
Maex, Karen; Kondoh, Eiichi; Lauwers, Anne; Steegen, An; de Potter de ten Broeck, Muriel; Besser, Paul; Proost, Joris (1998) -
Critical role of degassing for hot aluminum filling
Proost, Joris; Kondoh, Eiichi; Vereecke, Guy; Heyns, Marc; Maex, Karen (1998) -
Development of a non-destructive thin film porosimetry: pore size distribution and pore volume of porous silica
Baklanov, Mikhaïl; Dultsev, F. N.; Kondoh, Eiichi; Mogilnikov, K. P.; Maex, Karen; Wang, Sharon; Forester, Lynn (1999) -
In situ gas analysis on an RTP tool with APIMS
Vereecke, Guy; Kondoh, Eiichi; Richardson, Paul; Maex, Karen; Heyns, Marc; Nényei, Z. (1998) -
In-line ambient impurity measurement of a rapid thermal process chamber by using atmospheric pressure ionization mass spectrometer
Kondoh, Eiichi; Vereecke, Guy; Heyns, Marc; Maex, Karen; Gutt, T.; Nényei, Z. (1998) -
In-line monitoring of HF-last cleaning of implanted and non-implanted silicon surfaces by non-contact surface charge measurements
Kondoh, Eiichi; Trauwaert, Marie-Astrid; Heyns, Marc; Maex, Karen (1998) -
In-situ oxygen monitoring of rapid thermal process chamber: diagnosis of gas flow dynamics and wafer processing
Kondoh, Eiichi; Maex, Karen (1997) -
Interaction between Co and SiO2
Kondoh, Eiichi; Donaton, R. A.; Jin, S.; Bender, Hugo; Vandervorst, Wilfried; Maex, Karen (1998) -
Limitation of HF-based chemistry for deep-submicron contact hole cleaning on silicides
Baklanov, Mikhaïl; Kondoh, Eiichi; Alves Donaton, Ricardo; Vanhaelemeersch, Serge; Maex, Karen (1998) -
Measurements of trace gaseous ambient impurities on an atmospheric pressure rapid thermal processor
Kondoh, Eiichi; Vereecke, Guy; Heyns, Marc; Maex, Karen; Gutt, T. (1999) -
Non-destructive determination of pore size distribution of low-k porous SOG films
Baklanov, Mikhaïl; Kondoh, Eiichi; Gidley, D.; Lin, E.; Wu, Wen; Arao, H.; Mogilnikov, K. P.; Shamiryan, Denis; Nakashima, A. (2000) -
Oxidation and roughening of silicon during annealing in a rapid thermal processing chamber
Mohadjeri, Babak; Baklanov, Mikhaïl; Kondoh, Eiichi; Maex, Karen (1998)