Browsing by author "Roozeboom, F."
Now showing items 1-9 of 9
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Characterization of thermal and electrical stability of MOCVD HfO2-HfSiO4 dielectric layers with polysilicon electrodes for advanced CMOS technologies
Rittersma, Chris; Loo, Josine; Ponomarev, Youri; Verheijen, M.A.; Kaiser, M.; Roozeboom, F.; Van Elshocht, Sven; Caymax, Matty (2004) -
Electrical properties of MOCVD HfO2 dielectric layers with polysilicon gate electrodes for CMOS applications
Date, Lucien; Rittersma, Chris; Massoubre, D.; Ponomarev, Youri; Roozeboom, F.; Pique, Didier; Van Autryve, Luc; Van Elshocht, Sven; Caymax, Matty (2003) -
High speed atmospheric pressure ALD for industrial scale solar cell passivation
Vermang, Bart; Rothschild, Aude; Racz, A.; John, Joachim; Poortmans, Jef; Mertens, Robert; Poodt, P.; Tiba, V.; Roozeboom, F. (2010) -
Integration issues of polysilicon with high k dielectrics deposited by Atomic Layer Chemical Vapor Deposition
Tsai, Wilman; Chen, Jian; Carter, Richard; Cartier, Eduard; Kluth, Jon; Richard, Olivier; Claes, Martine; Lin, Steven; Nohira, Hiroshi; Conard, Thierry; Caymax, Matty; Young, Edward; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Manabe, Yukiko; Maes, Jan; Rittersma, Chris; Besling, Wim; Roozeboom, F. (2002) -
Laser annealing for ultra-shallow junction formation in advanced CMOS
Surdeanu, Radu; Ponomarev, Youri; Cerutti, R.; Pawlak, Bartek; Nanver, L.K.; Hoflijk, Ilse; Stolk, Peter; Dachs, Charles; Verheijen, M.A.; Kaiser, M.; Hopstaken, M.J.P.; van Berkum, J.G.M.; Roozeboom, F.; Lindsay, Richard (2002) -
Tantalum-based gate electrode metals for advanced CMOS devices
Hooker, Jacob; Lander, Rob; Cubaynes, Florence; Schram, Tom; Roozeboom, F.; van Zijl, J.; Maas, M.; van den Heuvel, F.C.; Naburgh, E.; van Berkum, J.G.M.; Tamminga, Y.; Dao, T.; Henson, Kirklen; Schaekers, Marc; Van Ammel, Annemie; Tokei, Zsolt; Demand, Marc; Dachs, C. (2005) -
The role of preamorphization and activation for ultra shallow junction formation on strained Si layers grown on SiGe buffer
Pawlak, Bartek; Vandervorst, Wilfried; Lindsay, Richard; De Wolf, Ingrid; Roozeboom, F.; Delhougne, Romain; Benedetti, Alessandro; Loo, Roger; Caymax, Matty; Maex, Karen; Cowern, N.E.B. (2004) -
The role of preamorphization and activation for ultra shallow junction formation on strained Si layers grown on SiGe buffer
Pawlak, Bartek; Vandervorst, Wilfried; Lindsay, Richard; De Wolf, Ingrid; Roozeboom, F.; Delhougne, Romain; Benedetti, Alessandro; Loo, Roger; Caymax, Matty; Maex, Karen; Cowern, N.E.B. (2004) -
Thermal processing of high-K materials thermodynamics and kinetics
Young, Edward; Chen, Jian; Cosnier, Vincent; Lysaght, P.; Maes, Jan; Roozeboom, F.; Zhao, Chao (2002)