Browsing by author "Yamamoto, Kazuhiko"
Now showing items 1-6 of 6
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45nm LSTP FET with FUSI gate on PVD-HfO2 with excellent drivability by advanced PDA treatment
Mitsuhashi, Riichirou; Yamamoto, Kazuhiko; Hayashi, S.; Rothschild, Aude; Kubicek, Stefan; Veloso, Anabela; Van Elshocht, Sven; Jurczak, Gosia; De Gendt, Stefan; Biesemans, Serge; Niwa, M. (2005) -
High-k dielectrics integration prospects
Kubicek, Stefan; Van Elshocht, Sven; Delabie, Annelies; Yamamoto, Kazuhiko; Beckx, Stephan; Claes, Martine; Van Hoornick, Nausikaa; Kwak, Dong Hwa; Hyun, Sangjin; Rothschild, Aude; Veloso, Anabela; Kottantharayil, Anil; Lujan, Guilherme; Kittl, Jorge; Lauwers, Anne; Kaushik, Vidya; Niwa, Masaaki; De Gendt, Stefan; Heyns, Marc; Jurczak, Gosia; Biesemans, Serge (2005) -
Ni-FUSI on high-k as a candidate for 65nm LSTP CMOS
Kubicek, Stefan; Veloso, Anabela; Kottantharayil, Anil; Hayashi, Shigenori; Yamamoto, Kazuhiko; Mitsuhashi, Riichirou; Kittl, Jorge; Lauwers, Anne; Horii, S.; Harada, Y.; Kubota, M.; Niwa, Masaaki; De Gendt, Stefan; Heyns, Marc; Jurczak, Gosia; Biesemans, Serge (2005-04) -
Prospect of Hf-based gate dielectric by PVD with FUSI gate for LSTP application
Niwa, Masaaki; Mitsuhashi, Riichirou; Yamamoto, Kazuhiko; Hayashi, S.; Harada, Y.; Kubota, M.; Rothschild, Aude; Hoffmann, Thomas Y.; Kubicek, Stefan; De Gendt, Stefan; Heyns, Marc; Biesemans, Serge (2005) -
PVD-HfSiON gate dielectrics with Ni-FUSI electrode for 65nm LSTP application
Yamamoto, Kazuhiko; Kubicek, Stefan; Rothschild, Aude; Mitsuhashi, Riichirou; Deweerd, Wim; Veloso, Anabela; Jurczak, Gosia; Biesemans, Serge; De Gendt, Stefan; Wickramanayaka, S.; Hayashi, S.; Niwa, Masaaki (2005-06) -
The importance of moisture control for EOT scaling of Hf-based dielectrics
Ragnarsson, Lars-Ake; Brunco, David; Yamamoto, Kazuhiko; Tokei, Zsolt; Pourtois, Geoffrey; Delabie, Annelies; Parmentier, Brigitte; Conard, Thierry; Roussel, Philippe; De Gendt, Stefan; Heyns, Marc (2009)