Browsing by author "Vandereyken, Jelle"
Now showing items 1-6 of 6
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Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration
D'Urzo, Lucia; Bayana, Hareen; Vandereyken, Jelle; Foubert, Philippe; Wu, Aiwen; Jaber, Jad; Hamzik, James (2017) -
Defectivity modulation in EUV resists through advanced filtration technologies
D'Urzo, Lucia; Umeda, T.; Mizuno, T.; Hattori, A.; Varanasi, R.; Singh, A.; Beera, R.; Foubert, Philippe; Vandereyken, Jelle; Drent, Waut (2020) -
EUV lithographic process enablement with novel litho track hardware
Santos, Andreia; Kosma, Vasiliki; Vandereyken, Jelle; Marhfour, H.; Tanaka, Y.; Harumoto, M.; Asai, M.; Stokes, H.; Suh, Hyo Seon; Foubert, Philippe; De Simone, Danilo (2021) -
EUV single exposure Tip-to-Tip variability control through PEB process optimization in BEOL layers
Roy, Syamashree; Caron, Elke; Santos, Andreia; Franke, Joern-Holger; Vandereyken, Jelle; Halder, Sandip (2023) -
Focus spot reduction by brush scrubber cleaning
Pacco, Antoine; Kesters, Els; Simms, Ihsan; Nafus, Kathleen; Vandereyken, Jelle; Yonekawa, Hiroki (2014) -
Integrated approach to improving local CD uniformity in EUV patterning
Liang, Andrew; Hermans, Jan; Tran, Tim; Viatkina, Katja; Liang, Chen-Wei; Ward, Brandon; Chuang, Steven; Yu, Jengyi; Harm, Greg; Vandereyken, Jelle; Rio, David; Kubis, Michael; Tan, Samantha; Wise, Rich; Dusa, Mircea; Reddy, Sirish; Singhal, Akhil; Van Schravendijk, Bart; Dixit, Girish; Shamma, Nader (2017)