Browsing by imec author "9d8d0492b545e613b7b5c336e809dc5442e43536"
Now showing items 21-28 of 28
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Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
De Schepper, Peter; Altamirano Sanchez, Efrain; Goodyear, Andy; El Otell, Ziad; de Marneffe, Jean-Francois; De Gendt, Stefan (2014) -
Plasma patterning of SIS modified DSA line space patterns into silicon
El Otell, Ziad; Singh, Arjun; Chan, BT; Gronheid, Roel; de Marneffe, Jean-Francois (2015) -
The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
De Schepper, Peter; El Otell, Ziad; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; De Gendt, Stefan (2015) -
The influence of hydrogen plasma treatment on LWR mitigation: The importance of EUV photoresist composition
De Schepper, Peter; El Otell, Ziad; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Gendt, Stefan (2014) -
Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas
Zotovich, Alexey; El Otell, Ziad; Sutton, Yvonne; Braithwaite, N. St. J.; de Marneffe, Jean-Francois; Baklanov, Mikhail (2016) -
Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
de Marneffe, Jean-Francois; Yamaguchi, Tatsuya; Fujikawa, Makoto; Rezvanov, Askar; Chanson, Romain; Zhang, Jianran; Babaei Gavan, Khashayar; El Otell, Ziad; Nozawa, S.; Kikuchi, Y.; Maekawa, Kaoru (2019) -
Vacuum ultra-violet emission of CF4 & CF3I containing plasmas and their effect on low-k materials
El Otell, Ziad; Samara, Vladimir; Zotovich, Alexey; Hansen, Terje; de Marneffe, Jean-Francois; Baklanov, Mikhaïl (2015) -
Vacuum ultra-violet emission of plasmas and their effect on etched materials
El Otell, Ziad; de Marneffe, Jean-Francois (2015)