Browsing by author "Ronse, Kurt"
Now showing items 61-80 of 225
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EUV lithography: recent achievements of a maturing technology
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2010) -
EUV lithography: status and further challenges towards a maturing technology
Vandenberghe, Geert; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Gronheid, Roel; Ronse, Kurt (2010) -
EUV mask defectivity: status and mitigation towards HVM
Jonckheere, Rik; Van Den Heuvel, Dieter; Lamantia, Matthew; Baudemprez, Bart; Hendrickx, Eric; Ronse, Kurt (2010) -
EUV pattern shift compensation strategies
Schmoeller, Thomas; Klimpel, Thomas; Kim, In Sung; Lorusso, Gian; Myers, Alan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2008) -
EUV resist material performance, progress and process improvements at imec
Goethals, Mieke; Niroomand, Ardavan; Ban, Keundo; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Jehoul, Christiane; Van Den Heuvel, Dieter; Ronse, Kurt (2010) -
EUV resist process development for full field imaging
Niroomand, Ardavan; Goethals, Mieke; Van Roey, Frieda; Kim, Byeong Soo; Lorusso, Gian; Pollentier, Ivan; Jonckheere, Rik; Ronse, Kurt (2007) -
EUVL at IMEC: shadowing compensation and Flare mitigation
Lorusso, Gian; Goethals, Mieke; Jonckheere, Rik; Hermans, Jan; Ronse, Kurt; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Ritter, D. (2007-11) -
EUVL development status & the need for computational litho
Ronse, Kurt; Vandenberghe, Geert (2010) -
EUVL Gen 2.0: Key requirements for constraining semiconductor cost in advanced technology node manufacturing
Mallik, Arindam; Debacker, Peter; McIntyre, Greg; Kim, Ryan Ryoung han; Ronse, Kurt (2018) -
EUVL introduction impact on development cycle for advanced technology
Mallik, Arindam; Ryckaert, Julien; Ronse, Kurt; Verkest, Diederik; Thean, Aaron (2016) -
EUVL is being inserted in HVM in 2019 : what are the mask related challenges remaining ?
Ronse, Kurt; Jonckheere, Rik; Gallagher, Emily; Philipsen, Vicky; Van Look, Lieve; Hendrickx, Eric; Kim, Ryan Ryoung han (2019) -
Evaluation of the ASML PAS5500/300 DUV stepper
Ronse, Kurt (1998) -
Evidence of printing blank-related defects on EUV masks missed by blank inspection
Jonckheere, Rik; Van Den Heuvel, Dieter; Hendrickx, Eric; Ronse, Kurt; Bret, Tristan; Hofmann, Thorsten; Magana, John; Aharonson, Israel; Meshulach, Doron (2011) -
Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum-UV cleaning
Okoroanyanwu, Uzo; Stepanenko, Nickolay; Vereecke, Guy; Eliat, Astrid; Kocsis, Michael; Kang, Young-Seog; Jonckheere, Rik; Conard, Thierry; Ronse, Kurt (2004) -
Experimental investigation of the impact of line-edge roughness on MOSFET performance and yield
Croon, Jeroen; Leunissen, Peter; Jurczak, Gosia; Benndorf, Michael; Rooyackers, Rita; Ronse, Kurt; Decoutere, Stefaan; Sansen, Willy; Maes, Herman (2003) -
Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections
Myers, Alan; Lorusso, Gian; Kim, In Sung; Goethals, Mieke; Jonckheere, Rik; Hermans, Jan; Baudemprez, Bart; Ronse, Kurt (2008) -
Extending ArF to the 65-nm node with full-phase lithography
Driessen, Frank; Pierrat, C.; Vandenberghe, Geert; Ronse, Kurt; Van Adrichem, Paul; Liu, H.Y. (2003) -
Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994) -
Extreme scaling of optical lithography: overview of process integration issues
Ronse, Kurt; Wiaux, Vincent; Verhaegen, Staf; Van Look, Lieve; Bekaert, Joost; Laidler, David; Cheng, Shaunee; Maenhoudt, Mireille; Vandenberghe, Geert; Dusa, Mircea (2009) -
Feasability demonstration of 0.18 µm and 0.13 µm optical projection lithography based on CD control calculations
Kim, Kee - Ho; Ronse, Kurt; Yen, Anthony; Van den hove, Luc (1996)