Browsing by author "Ronse, Kurt"
Now showing items 81-100 of 225
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Feasibility of 250 nm gate patterning using i-line with OPC
Van Driessche, Veerle; Finders, Jo; Tritchkov, Alexander; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen (1998) -
Feasibility of printing 0.1μm technology with optical lithography
Maenhoudt, Mireille; Verhaegen, Staf; Ronse, Kurt; Flagello, D.; Geh, B.; Kaiser, W. (1999) -
Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography
Pforr, Rainer; Wong, Alfred; Ronse, Kurt; Van den hove, Luc; Yen, Anthony; Palmer, S.; Fuller, G.; Otto, O. (1995) -
Flare mitigation strategies in extreme ultraviolet lithography
Kim, Insung; Myers, Alan; Melvin, Lawrence; Ward, Brian; Lorusso, Gian; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2008) -
From ASML Alpha-demo tool to ASML NXE:3100 at imec - EUV lithography heading towards pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Philipsen, Vicky; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2011) -
Front-end-of-line process development using 193-nm lithography
Pollentier, Ivan; Ercken, Monique; Eliat, Astrid; Delvaux, Christie; Jaenen, Patrick; Ronse, Kurt (2001) -
Full field EUV lithography turning into reality at IMEC
Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Hermans, Jan; Baudemprez, Bart; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Ronse, Kurt (2007) -
Full field EUV lithography: lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles
Hendrickx, Eric; Goethals, Mieke; Niroomand, Ardavan; Jonckheere, Rik; Van Roey, Frieda; Lorusso, Gian; Hermans, Jan; Baudemprez, Bart; Ronse, Kurt (2008) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
Fullfield 27nm CD control and modeling
Hendrickx, Eric; Philipsen, Vicky; Hermans, Jan; Lorusso, Gian; Vandenberghe, Geert; Ronse, Kurt; Klosterman, Ulrich; Gao, Weimin; Schmoeller, Thomas (2010) -
Fundamental Principles of Phase Shifting Masks by Fourier Optics: Theory and Experimental Verification
Ronse, Kurt; Op de Beeck, Maaike; Van den hove, Luc; Engelen, J. (1994) -
Future Logic Scaling: Towards Atomic Channels and Deconstructed Chips
Samavedam, Sri; Ryckaert, Julien; Beyne, Eric; Ronse, Kurt; Horiguchi, Naoto; Tokei, Zsolt; Radu, Iuliana; Garcia Bardon, Marie; Na, Myung Hee; Spessot, Alessio; Biesemans, Serge (2020) -
High yield sub-0.1μm² 6T-SRAM Cells, featuring high-k/metal-gate Finfet devices, double gate patterning, a novel Fin etch strategy, full-field EUV lithography and optimized junction design & layout
Horiguchi, Naoto; Demuynck, Steven; Ercken, Monique; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Vandeweyer, Tom; Baerts, Christina; Mannaert, Geert; Truffert, Vincent; Verluijs, j; Alaerts, Wilfried; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Vandenberghe, Geert; Beyer, Gerald; Lauwers, Anne; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2010) -
How to use DUV BARCs on topography
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Zhang, Fenghong; Delvaux, Christie; Van Puyenbroeck, Ilse; Ronse, Kurt (1998) -
Hyper NA EUV lithography: an imaging perspective
Lee, Inhwan; Franke, Joern-Holger; Philipsen, Vicky; Ronse, Kurt; De Gendt, Stefan; Hendrickx, Eric (2023) -
Hyper-NA imaging using two-beam interference
Hendrickx, Eric; Van Look, Lieve; Versluijs, Janko; Ronse, Kurt (2005) -
Imaging performance of the EUV alpha demo tool at IMEC
Lorusso, Gian; Hermans, Jan; Goethals, Mieke; Baudemprez, Bart; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Kim, Byeong Soo; Jonckheere, Rik; Niroomand, Ardavan; Lok, E.; Van Dijk, A.; de Marneffe, Jean-Francois; Demuynck, Steven; Goossens, Danny; Ronse, Kurt (2008) -
IMEC N7, N5 and beyond: DTCO, STCO and EUV insertion strategy to maintain affordable scaling trend
Kim, Ryan Ryoung han; Sherazi, Yasser; Debacker, Peter; Raghavan, Praveen; Ryckaert, Julien; Mallik, Arindam; Verkest, Diederik; Lee, Jae Uk; Gillijns, Werner; Tan, Ling Ee; Blanco, Victor; Ronse, Kurt; McIntyre, Greg (2018) -
Impact of a SADP flow on the design and process for N10/N7 layers
Gillijns, Werner; Sherazi, Yasser; Trivkovic, Darko; Chava, Bharani; Vandewalle, B.; Gerousis, V.; Raghavan, Praveen; Ryckaert, Julien; Mercha, Abdelkarim; Verkest, Diederik; McIntyre, Greg; Ronse, Kurt (2015) -
Impact of hyper-NA reticle properties on ArF immersion lithography
Leunissen, Peter; Ronse, Kurt; Philipsen, Vicky; Jonckheere, Rik; Aksenov, Yuri; Bekaert, Joost (2004-12)