Publication:

Use of surface haze for evaluation of photoresist residue removal efficiency

Date

2009

Journal article

Simple item page Full metadata Statistics

Files

18542.pdf 1.65 MB

Author(s)

;

;

;

;

;

Radovanovic, Sanda

;

Dighe, Prasanna

;

Leunissen, Peter

;

Journal

IEEE Transactions on Semiconductor Manufacturing

Metrics

1939 since deposited on 2021-10-17

1last month

Acq. date: 2025-12-14