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Toward the 5nm technology: layout optimization and performance benchmark for logic/SRAMs using lateral and vertical GAA FETs

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dc.contributor.authorHuynh Bao, Trong
dc.contributor.authorRyckaert, Julien
dc.contributor.authorSakhare, Sushil
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorVerkest, Diederik
dc.contributor.authorThean, Aaron
dc.contributor.authorWambacq, Piet
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorVerkest, Diederik
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorWambacq, Piet
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecVerkest, Diederik::0000-0001-6567-2746
dc.contributor.orcidimecWambacq, Piet::0000-0003-4388-7257
dc.date.accessioned2021-10-23T11:26:21Z
dc.date.available2021-10-23T11:26:21Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26760
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505310
dc.source.beginpage978102
dc.source.conferenceDesign-Process-Technology Co-optimization for Manufacturability X
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.title

Toward the 5nm technology: layout optimization and performance benchmark for logic/SRAMs using lateral and vertical GAA FETs

dc.typeProceedings paper
dspace.entity.typePublication
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