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Articles
Sub-resolution feature OPC as an enabler for manufacturing at 0.2 μm and below
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Sub-resolution feature OPC as an enabler for manufacturing at 0.2 μm and below
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Date
1998
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Randall, John
;
Tritchkov, Alexander
;
Ronse, Kurt
;
Jaenen, Patrick
Journal
Microelectronic Engineering
Abstract
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1
since deposited on 2021-10-01
Acq. date: 2025-12-11
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1932
since deposited on 2021-10-01
Acq. date: 2025-12-11
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Downloads
1
since deposited on 2021-10-01
Acq. date: 2025-12-11
Views
1932
since deposited on 2021-10-01
Acq. date: 2025-12-11
Citations