Publication:

Recess metrology challenges for 3D device architectures in advanced technology nodes

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2613771
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dc.contributor.authorSantoro, Gaetano
dc.contributor.authorHouchens, Kevin
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorElizov, Moshe
dc.contributor.authorYaron, Lior
dc.contributor.authorChemama, Michael
dc.contributor.authorGoldenshtein, Alex
dc.contributor.authorZakay, Amit
dc.contributor.authorAmit, Noam
dc.contributor.authorBriggs, Basoene
dc.contributor.authorPacco, Antoine
dc.contributor.authorDelhougne, Romain
dc.contributor.authorCockburn, Andrew
dc.contributor.authorAbramovitz, Yaniv
dc.contributor.authorTam, Aviram
dc.contributor.authorAdan, Ofer
dc.contributor.authorMertens, Hans
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorLeray, Philippe
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorDelhougne, Romain
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecPacco, Antoine::0000-0001-6330-5053
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.date.accessioned2022-12-13T10:31:37Z
dc.date.available2022-09-08T02:39:17Z
dc.date.available2022-12-13T10:31:37Z
dc.date.issued2022
dc.identifier.doi10.1117/12.2613771
dc.identifier.eisbn978-1-5106-4982-8
dc.identifier.isbn978-1-5106-4981-1
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40383
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage120530L
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateFEB 24-MAY 27, 2022
dc.source.conferencelocationSan Jose, CA, USA
dc.source.journalProceedings of SPIE
dc.source.numberofpages13
dc.source.volume12053
dc.title

Recess metrology challenges for 3D device architectures in advanced technology nodes

dc.typeProceedings paper
dspace.entity.typePublication
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